A Partially Depleted SOI CMOS-technology with advanced processing for 130 nm channel length

Author

Pindl, S. ; Berthold, J. ; Huttner, T. ; Reif, S. ; Schumann, D. ; von Philipsborn, H.

Author_Institution

Siemens AG, Munich, Germany

fYear

1998

fDate

8-10 Sept. 1998

Firstpage

268

Lastpage

271

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 1998. Proceeding of the 28th European

Conference_Location

Bordeaux, France

Print_ISBN

2-86332-234-6

Type

Filename

1503540

Link To Document