Title :
Status, Trends, Comparison and Evolution of EPROM and FLASH EEPROM Technologies
Author_Institution :
Nat. Semicond. Inc., Santa Clara, CA, USA
Abstract :
The actual status of EPROM and FLASH EPROM technology is reviewed in term of market growth and potential applications . The different Flash cell approaches are compared in term of Process Complexity , manufacturability , yield and scaling limiting factors as well as disturb mechanisms , cycling endurance and reliability . The issues for future low power generation are reviewed along with the different trends.
Keywords :
EPROM; flash memories; cycling endurance; disturb mechanisms; flash EEPROM technology; flash cell approach; low power generation; process complexity; reliability; Costs; EPROM; Manufacturing processes; Plastic packaging; Power generation; Random access memory; Read-write memory; Semiconductor device manufacture; Semiconductor device reliability; Semiconductor memory;
Conference_Titel :
Solid State Device Research Conference, 1993. ESSDERC '93. 23rd European
Conference_Location :
Grenoble
