• DocumentCode
    1914748
  • Title

    Bitline contacts in high density SRAMs: design for testability and stressability

  • Author

    Pilo, Harold ; Adams, R. Dean ; Busch, Robert E. ; Nelson, Erik A. ; Rudgers, George E.

  • Author_Institution
    Microelectron. Div., IBM Corp., Essex Junction, VT, USA
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    776
  • Lastpage
    782
  • Abstract
    Process scaling and the need for smaller SRAM cells challenges process technologies to make millions of robust and reliable bitline contacts on a single chip. Another challenge is to identify marginal, resistive and unreliable bitline contacts given the inherent electrical characteristics of the SRAM cell. This paper describes two design techniques that improve the screenability and stressability of bitline contacts in high-density SRAMs. These techniques are developed to overcome the lack of detectability of resistive bitline contacts in SRAM cells
  • Keywords
    SRAM chips; contact resistance; design for testability; environmental stress screening; integrated circuit reliability; integrated circuit testing; bitline contacts; design for testability; design techniques; high density SRAMs; process scaling; resistive bitline contacts; screenability; six-transistor SRAM cell; stressability; unreliable bitline contact identification; Contact resistance; Current supplies; Design for testability; Electric variables; Microelectronics; Random access memory; Rivers; Robustness; Stability; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Test Conference, 2001. Proceedings. International
  • Conference_Location
    Baltimore, MD
  • ISSN
    1089-3539
  • Print_ISBN
    0-7803-7169-0
  • Type

    conf

  • DOI
    10.1109/TEST.2001.966699
  • Filename
    966699