Title : 
Bitline contacts in high density SRAMs: design for testability and stressability
         
        
            Author : 
Pilo, Harold ; Adams, R. Dean ; Busch, Robert E. ; Nelson, Erik A. ; Rudgers, George E.
         
        
            Author_Institution : 
Microelectron. Div., IBM Corp., Essex Junction, VT, USA
         
        
        
        
        
        
            Abstract : 
Process scaling and the need for smaller SRAM cells challenges process technologies to make millions of robust and reliable bitline contacts on a single chip. Another challenge is to identify marginal, resistive and unreliable bitline contacts given the inherent electrical characteristics of the SRAM cell. This paper describes two design techniques that improve the screenability and stressability of bitline contacts in high-density SRAMs. These techniques are developed to overcome the lack of detectability of resistive bitline contacts in SRAM cells
         
        
            Keywords : 
SRAM chips; contact resistance; design for testability; environmental stress screening; integrated circuit reliability; integrated circuit testing; bitline contacts; design for testability; design techniques; high density SRAMs; process scaling; resistive bitline contacts; screenability; six-transistor SRAM cell; stressability; unreliable bitline contact identification; Contact resistance; Current supplies; Design for testability; Electric variables; Microelectronics; Random access memory; Rivers; Robustness; Stability; Voltage;
         
        
        
        
            Conference_Titel : 
Test Conference, 2001. Proceedings. International
         
        
            Conference_Location : 
Baltimore, MD
         
        
        
            Print_ISBN : 
0-7803-7169-0
         
        
        
            DOI : 
10.1109/TEST.2001.966699