DocumentCode :
1915445
Title :
Influence of Fluorinated Gate Oxides on the Low Frequency Noise of MOS Transistors under Analog Operation
Author :
Brederlow, Ralf ; Weber, Werner ; Jurk, Reinhard ; Dahl, Claus ; Kessel, Sylvia ; Holz, Jürgen ; Sauert, Wolfgang ; Klein, Peter ; Lemaitre, Bernd ; Schmitt-Landsiede, D. ; Thewes, Roland
Author_Institution :
Siemens AG, Munich, Germany
fYear :
1998
fDate :
8-10 Sept. 1998
Firstpage :
472
Lastpage :
475
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 1998. Proceeding of the 28th European
Conference_Location :
Bordeaux, France
Print_ISBN :
2-86332-234-6
Type :
conf
Filename :
1503591
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1915445
