Atmospheric pressure discharge plasma processing for gaseous air contaminants

Author

Oda, Tetsuji ; Yamashita, Ryuichi ; Takahashi, Tadashi ; Masuda, Senichi

Author_Institution

Dept. of Electr. Eng., Tokyo Univ., Japan

fYear

1993

fDate

2-8 Oct 1993

Firstpage

1983

Abstract

The authors investigated the decomposition performance of gaseous environmental destructive contaminants in air by using atmospheric-pressure discharge plasma including SPCP (surface discharge induced plasma chemical processing). Contaminants tested were chlorofluorocarbon (CFC-113) and trichloroethylene. The discharge exciting frequency range was wide, from 50 Hz to 50 kHz. Low-frequency discharge requires high voltage to inject high electric power into the gas and to decompose contaminants. A gaschromato mass spectrometer analyzed discharge products of dense CFC-113 or trichloroethylene, and HCl, CClFO, CHCl, etc. were detected as products. Two different electrode configurations, silent discharge (coaxial) electrode and coil electrode, were tested and compared

Keywords

air pollution detection and control; plasma applications; surface discharges; 50 Hz to 50 kHz; CClFO; CFC-113; CHCl; HCl; atmospheric pressure; chlorofluorocarbon; coaxial electrodes; coil electrode; discharge plasma processing; environmental destructive contaminants; gaschromato mass spectrometer; gaseous air contaminants; low frequency discharge; plasma chemical processing; silent discharge electrodes; surface discharge; trichloroethylene; Atmospheric-pressure plasmas; Chemical processes; Electrodes; Frequency; Plasma chemistry; Plasma density; Plasma materials processing; Surface contamination; Surface discharges; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Industry Applications Society Annual Meeting, 1993., Conference Record of the 1993 IEEE

Conference_Location

Toronto, Ont.

Print_ISBN

0-7803-1462-X

Type

conf

DOI

10.1109/IAS.1993.299132

Filename

299132