Physical study of RTP N2O-and NH3-nitrided thin SiO2 films
Author :
Bouvet, D. ; Clivaz, P.A. ; Almeida, J. ; Coluzza, C. ; Margaritondo, G. ; Letourneau, P. ; Dutoit, M. ; Dubois, C. ; Dupuy, J.C. ; Pio, F.
Author_Institution :
Swiss Federal Institute of Technology, CH 1015 Lausanne, Switzerland
fYear :
1994
fDate :
11-15 Sept. 1994
Firstpage :
29
Lastpage :
32
Keywords :
Chemical analysis; Electric variables measurement; Energy resolution; Etching; Interface states; Microelectronics; Microscopy; Nitrogen; Rapid thermal processing; Research and development;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1994. ESSDERC '94. 24th European
