DocumentCode
1917016
Title
Deactivation Phenomenon for 0.18um Technology Indium Channel NMOS Devices
Author
Puchner, H. ; Aronowitz, S. ; Zubkov, V.
Author_Institution
LSI Logic Corporation, Santa Clara, USA
fYear
2000
fDate
11-13 September 2000
Firstpage
104
Lastpage
107
Keywords
Boron; CMOS technology; Doping; Impurities; Indium; MOS devices; MOSFETs; Nitrogen; Silicon; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 2000. Proceeding of the 30th European
Print_ISBN
2-86332-248-6
Type
conf
DOI
10.1109/ESSDERC.2000.194725
Filename
1503655
Link To Document