مرکز منطقه ای اطلاع رساني علوم و فناوري - Global Planarization of Ozone TEOS Oxide by Resist Etch Back for Sub-0.5μm Multilevel Metallization

DocumentCode :

1917692

Title :

Global Planarization of Ozone TEOS Oxide by Resist Etch Back for Sub-0.5μm Multilevel Metallization

Author :

Neureither, B. ; Binder, F. ; Fischer, E. ; Gabric, Z. ; Koller, K. ; Röhl, S. ; Spindler, O.

Author_Institution :

Siemens AG, Components Group, Otto-Hahn-Ring 6, 81730 Munich

fYear :

1994

fDate :

11-15 Sept. 1994

Firstpage :

133

Lastpage :

136

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Solid State Device Research Conference, 1994. ESSDERC '94. 24th European

Conference_Location :

Edinburgh, Scotland

Print_ISBN :

0863321579

Type :

conf

Filename :

5435686

Link To Document :