Extending KrF Lithography to 0.13 um sub-8F2 DRAM Technology: The Importance of Lithography-Centric Design

Author

Bukofsky, S. ; Thomas, A. ; Kunkel, G. ; Preuninger, J.

Author_Institution

IBM Microelectronics, Hopewell Junction, NY, USA

fYear

2000

fDate

11-13 September 2000

Firstpage

192

Lastpage

195

Keywords

Capacitors; Lenses; Lithography; Microelectronics; Process design; Random access memory; Resists; Sorting; Space technology; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 2000. Proceeding of the 30th European

Print_ISBN

2-86332-248-6

Type

DOI

10.1109/ESSDERC.2000.194747

Filename

1503677

Link To Document