DocumentCode
1917843
Title
IC-Compatible Two-level Bulk Micromachining for RF Silicon Technology
Author
Pham, N.P. ; Sarro, P.M. ; Ng, K.T. ; Burghartz, J.N.
Author_Institution
Delft University of Technology, The Netherlands
fYear
2000
fDate
11-13 September 2000
Firstpage
204
Lastpage
207
Keywords
Etching; Fabrication; Inductors; Integrated circuit technology; Micromachining; Microstrip; Plasma applications; Radio frequency; Radiofrequency integrated circuits; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 2000. Proceeding of the 30th European
Print_ISBN
2-86332-248-6
Type
conf
DOI
10.1109/ESSDERC.2000.194750
Filename
1503680
Link To Document