DocumentCode
1918189
Title
High Current Gain Lateral Bipolar Action in DMOS Transistors
Author
Edholm, B. ; Olsson, J. ; Söderbärg, A. ; Bohlin, K. ; Magnusson, F.
Author_Institution
Dep. of Technology, Electronics, Uppsala University, P. O. Box 534, S-751 21, Uppsala, Sweden
fYear
1994
fDate
11-15 Sept. 1994
Firstpage
221
Lastpage
224
Abstract
This paper describes a new operation mode of the DMOS transistor. By utilizing the diffused channel region as base and connecting it to the gate, hybrid lateral bipolar operation is obtained in the device. Current gain higher than 2000 and a cut-off frequency of 1.6 GHz are achieved. Superior breakdown voltages were obtained compared to previously published hybrid devices. It is demonstrated that hybrid operation of a DMOS transistor is a simple way to implement a high gain lateral bipolar transistor, without complex sub-¿ processing.
Keywords
Bipolar integrated circuits; Bipolar transistors; Charge carrier processes; Cutoff frequency; Doping; Hybrid integrated circuits; Joining processes; MOSFETs; Manufacturing processes; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1994. ESSDERC '94. 24th European
Conference_Location
Edinburgh, Scotland
Print_ISBN
0863321579
Type
conf
Filename
5435706
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