Title :
2D dopant profiling of advanced CMOS technologies by preferential etching, comparison with 2D process simulations
Author :
Dachs, C.J.J. ; Verheijen, M.A. ; Kaiser, M. ; Stolk, P.A. ; Ponomarev, Y.V.
Author_Institution :
Philips Research Laboratories, Eindhoven, The Netherlands
fDate :
11-13 September 2000
Keywords :
Atomic force microscopy; CMOS process; CMOS technology; Chemicals; Doping profiles; Etching; Hafnium; Implants; MOSFETs; Transmission electron microscopy;
Conference_Titel :
Solid-State Device Research Conference, 2000. Proceeding of the 30th European
Print_ISBN :
2-86332-248-6
DOI :
10.1109/ESSDERC.2000.194789
