DocumentCode
1918753
Title
2D dopant profiling of advanced CMOS technologies by preferential etching, comparison with 2D process simulations
Author
Dachs, C.J.J. ; Verheijen, M.A. ; Kaiser, M. ; Stolk, P.A. ; Ponomarev, Y.V.
Author_Institution
Philips Research Laboratories, Eindhoven, The Netherlands
fYear
2000
fDate
11-13 September 2000
Firstpage
360
Lastpage
363
Keywords
Atomic force microscopy; CMOS process; CMOS technology; Chemicals; Doping profiles; Etching; Hafnium; Implants; MOSFETs; Transmission electron microscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 2000. Proceeding of the 30th European
Print_ISBN
2-86332-248-6
Type
conf
DOI
10.1109/ESSDERC.2000.194789
Filename
1503719
Link To Document