DocumentCode :
1918958
Title :
Investigation of the suitability of spike anneal for advanced CMOS technology
Author :
Lenoble, D. ; Josse, E. ; Grouillet, A. ; Arnaud, F. ; Julien, C. ; Skotnicki, T. ; Haond, M.
Author_Institution :
France Telecom, Meylan, France
fYear :
2000
fDate :
11-13 September 2000
Firstpage :
392
Lastpage :
395
Keywords :
Annealing; CMOS process; CMOS technology; Degradation; Electric resistance; Electrical resistance measurement; MOS devices; MOSFET circuits; Microelectronics; Telecommunications;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2000. Proceeding of the 30th European
Print_ISBN :
2-86332-248-6
Type :
conf
DOI :
10.1109/ESSDERC.2000.194797
Filename :
1503727
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1918958
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