Optimization of extension doping technology for roll-off suppression of industrial 0.1-um pMOSFETs

Author

Lenoble, D. ; Josse, E. ; Grouillet, A. ; Julien, C. ; Skotnicki, T. ; Walther, S. ; Liebert, R.B.

Author_Institution

France Telecom, Meylan, France

fYear

2000

fDate

11-13 September 2000

Firstpage

400

Lastpage

403

Keywords

Atomic measurements; Boron; CMOS technology; Communication industry; Doping; Fabrication; Ion beams; Ion implantation; MOSFETs; Sea measurements;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 2000. Proceeding of the 30th European

Print_ISBN

2-86332-248-6

Type

DOI

10.1109/ESSDERC.2000.194799

Filename

1503729

Link To Document