Ultra-Thin High Quality Oxynitride Formed by NH3 Nitridation and High Pressure O2 Re-oxidation

Author

Luo, T.Y. ; Watt, V.H.C. ; Al-Shareef, H.N. ; Brown, G.A. ; Karamcheti, A. ; Jackson, M.D. ; Huff, H.R. ; Evans, B. ; Kwong, D.L.

Author_Institution

University of Texas at Austin, Austin, TX, USA

fYear

2000

fDate

11-13 September 2000

Firstpage

404

Lastpage

407

Keywords

Boron; Dielectrics; Electrodes; Furnaces; Leakage current; MOSFETs; Nitrogen; Silicon; Temperature; Thickness measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 2000. Proceeding of the 30th European

Print_ISBN

2-86332-248-6

Type

DOI

10.1109/ESSDERC.2000.194800

Filename

1503730

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