DocumentCode

1919212

Title

A GaAs Device Isolation Technique by Liquid Phase Chemical-Enhanced Oxidation

Author

Wang, H.H. ; Chou, D.W. ; Wu, J.Y. ; Wang, Y.H. ; Houng, M.P.

Author_Institution

National Cheng-Kung University, Tainan, Taiwan

fYear

2000

fDate

11-13 September 2000

Firstpage

432

Lastpage

435

Keywords

Chemicals; Etching; Gallium arsenide; Oxidation;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 2000. Proceeding of the 30th European

Print_ISBN

2-86332-248-6

Type

conf

DOI

10.1109/ESSDERC.2000.194807

Filename

1503737