DocumentCode
1919436
Title
An Analytical Hot-Carrier Degradation Model for LDD NMOSFETs
Author
Goo, Jung-Suk ; Kim, Young-Gwan ; l´Yee, Hyeokjae ; Kwon, Ho-Yup ; Shin, Hyungsoon
Author_Institution
Central R&D Laboratory, GoldStar Electron Co., Ltd., 16, Woomyeon, Seocho, Seoul, 137-140, KOREA
fYear
1994
fDate
11-15 Sept. 1994
Firstpage
425
Lastpage
428
Keywords
Analytical models; Charge pumps; Degradation; Hot carriers; Implants; Interface states; MOSFET circuits; Predictive models; Stress; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1994. ESSDERC '94. 24th European
Conference_Location
Edinburgh, Scotland
Print_ISBN
0863321579
Type
conf
Filename
5435751
Link To Document