Title :
Short Channel Vertical Sidewall Transistors
Author :
Schulz, T. ; Rösner, W. ; Risch, L. ; Langmann, U.
Author_Institution :
Infineon Technologies AG, Munich, Germany
fDate :
11-13 September 2000
Keywords :
CMOS process; Doping; Etching; Fabrication; Lithography; MOSFETs; Silicon; Switches; Tellurium; Transconductance;
Conference_Titel :
Solid-State Device Research Conference, 2000. Proceeding of the 30th European
Print_ISBN :
2-86332-248-6
DOI :
10.1109/ESSDERC.2000.194837
