Title :
Ultrafast carrier dynamics of surfactant-mediated-grown InAs/GaAs quantum-dot structures designed for THz applications
Author :
Daghestani, Nart S. ; Alduraibi, Mohammad ; Piwonski, T. ; Ochalski, T. ; Huyet, G. ; Missous, Mohamed ; Ackemann, T. ; Cataluna, M.A.
Author_Institution :
Ultrafast Photonics Group, Univ. of Dundee, Dundee, UK
Abstract :
Quantum-dot (QD) materials have shown great promise for THz photoconductive devices. The generation of THz radiation relies on the excitation of highly-mobile carriers with sub-picosecond lifetimes. The band structure of QD materials grown for such THz applications leads to a multitude of energy bands/levels [1], onto which carriers can be excited. Here we show for the first time that the lifetime of carriers excited into the GaAs barriers (λ=800 nm) is up to two orders of magnitude shorter than when these are excited resonantly within the QDs (λ=1245 nm). We also present annealed QD-structures which exhibit faster carrier lifetimes than as-grown ones for most pump conditions, a feature unreported so far. Furthermore, an increase of carrier lifetime with the incident pump power is also unveiled for both annealed and as-grown samples. This study has significant implications in the understanding and optimal use of QD materials for THz generation applications [2].
Keywords :
III-V semiconductors; carrier lifetime; gallium arsenide; high-speed optical techniques; indium compounds; semiconductor quantum dots; terahertz wave devices; GaAs barriers; InAs-GaAs; THz applications; THz photoconductive devices; THz radiation generation; band structure; carrier lifetimes; incident pump power; surfactant-mediated-grown quantum-dot structures; ultrafast carrier dynamics; wavelength 800 nm; Annealing; Charge carrier lifetime; Educational institutions; Gallium arsenide; Quantum dots; Reflectivity;
Conference_Titel :
Lasers and Electro-Optics Europe (CLEO EUROPE/IQEC), 2013 Conference on and International Quantum Electronics Conference
Conference_Location :
Munich
Print_ISBN :
978-1-4799-0593-5
DOI :
10.1109/CLEOE-IQEC.2013.6801116