Title :
A Tuneable Metal Gate Work Function Using Solid State Diffusion of Nitrogen
Author :
Lander, R.J.P. ; Hooker, J.C. ; Van Zijl, J.P. ; Roozeboom, F. ; Maas, M. P M ; Tamminga, Y. ; Wolters, R.A.M.
Author_Institution :
Philips Research, Leuven, Belgium
fDate :
24-26 September 2002
Keywords :
Annealing; CMOS technology; Dielectrics; Electrodes; Implants; MOSFET circuits; Nitrogen; Solid state circuits; Sputtering; Tin;
Conference_Titel :
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN :
88-900847-8-2
DOI :
10.1109/ESSDERC.2002.194880
