A Tuneable Metal Gate Work Function Using Solid State Diffusion of Nitrogen

Author

Lander, R.J.P. ; Hooker, J.C. ; Van Zijl, J.P. ; Roozeboom, F. ; Maas, M. P M ; Tamminga, Y. ; Wolters, R.A.M.

Author_Institution

Philips Research, Leuven, Belgium

fYear

2002

fDate

24-26 September 2002

Firstpage

103

Lastpage

106

Keywords

Annealing; CMOS technology; Dielectrics; Electrodes; Implants; MOSFET circuits; Nitrogen; Solid state circuits; Sputtering; Tin;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 2002. Proceeding of the 32nd European

Print_ISBN

88-900847-8-2

Type

DOI

10.1109/ESSDERC.2002.194880

Filename

1503810

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