Title :
A New Method to Enhance Mobility of Poly-Si Tft Recrystallized by Excimer Laser Annealing
Author :
Kuriyama, H. ; Kiyama, S. ; Kuwahara, T. ; Noguchi, S. ; Nakano, S.
Author_Institution :
Giant Electronics Technology Co., Ltd., Japan
Keywords :
Annealing; Glass; Grain size; Heating; Laser transitions; Solid lasers; Substrates; Surface emitting lasers; Temperature; Thin film transistors;
Conference_Titel :
Device Research Conference, 1991. 49th Annual
Conference_Location :
Boulder, CO, USA
Print_ISBN :
0-87942-647-0
DOI :
10.1109/DRC.1991.664674
