• DocumentCode
    1921460
  • Title

    Characteristics of Passivated High-Voltage Silicon Carbide Diodes

  • Author

    Savage, S.M. ; Ramberg, L.P. ; Kronlund, B. ; Bergman, K.

  • Author_Institution
    Industrial Microelectronics Center, PO Box 1084, S-164 21 Kista, Sweden
  • fYear
    1994
  • fDate
    11-15 Sept. 1994
  • Firstpage
    753
  • Lastpage
    756
  • Abstract
    The processing and characterisation of 6H-SiC PiN diodes is described. Comparisons are made between diodes with different surface passivations, and numerical simulation is used to better understand their behaviour. A ``wet´´ thermal oxide with a deposited silicon nitride layer on top is found to be the best surface passivation. This permits on-wafer high-voltage measurements to be made in air, possibly for the first time. Numerical simulation is used to improve the understanding of the behaviour of these devices.
  • Keywords
    Anodes; Cathodes; Diodes; Etching; Medical simulation; Numerical simulation; Passivation; Silicon carbide; Temperature; Thermal conductivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1994. ESSDERC '94. 24th European
  • Conference_Location
    Edinburgh, Scotland
  • Print_ISBN
    0863321579
  • Type

    conf

  • Filename
    5435826