DocumentCode
1921460
Title
Characteristics of Passivated High-Voltage Silicon Carbide Diodes
Author
Savage, S.M. ; Ramberg, L.P. ; Kronlund, B. ; Bergman, K.
Author_Institution
Industrial Microelectronics Center, PO Box 1084, S-164 21 Kista, Sweden
fYear
1994
fDate
11-15 Sept. 1994
Firstpage
753
Lastpage
756
Abstract
The processing and characterisation of 6H-SiC PiN diodes is described. Comparisons are made between diodes with different surface passivations, and numerical simulation is used to better understand their behaviour. A ``wet´´ thermal oxide with a deposited silicon nitride layer on top is found to be the best surface passivation. This permits on-wafer high-voltage measurements to be made in air, possibly for the first time. Numerical simulation is used to improve the understanding of the behaviour of these devices.
Keywords
Anodes; Cathodes; Diodes; Etching; Medical simulation; Numerical simulation; Passivation; Silicon carbide; Temperature; Thermal conductivity;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1994. ESSDERC '94. 24th European
Conference_Location
Edinburgh, Scotland
Print_ISBN
0863321579
Type
conf
Filename
5435826
Link To Document