DocumentCode :
1921590
Title :
Enhanced Intrinsic Gain (gm/gd) of PMOSFETs with a Si
Author :
Lindgren, A.C. ; Hellberg, P.E. ; von Haartman, M. ; Wu, D. ; Menon, C. ; Zhang, S.L. ; Östling, M.
Author_Institution :
Royal Institute of Technology, Kista, Sweden
fYear :
2002
fDate :
24-26 September 2002
Firstpage :
175
Lastpage :
178
Keywords :
Annealing; Degradation; Epitaxial layers; Germanium silicon alloys; Information technology; MOSFETs; Microelectronics; Silicon germanium; Transconductance; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN :
88-900847-8-2
Type :
conf
DOI :
10.1109/ESSDERC.2002.194898
Filename :
1503828
Link To Document :
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