DocumentCode
1921796
Title
11.1: Development of vacuum transistor using hafnium nitride field emitter array
Author
Ikeda, Keita ; Ohue, Wataru ; Endo, Keisuke ; Gotoh, Yasuhito ; Tsuji, Hiroshi
Author_Institution
Dept. of Electron. Sci. & Eng., Kyoto Univ., Kyoto, Japan
fYear
2010
fDate
26-30 July 2010
Firstpage
207
Lastpage
208
Abstract
We fabricated gated 40,000-tip HfN-FEAs and evaluated HfN-FEA as an active device. The vacuum transistor has triode structure of a gated HfN-FEA and collector electrode. This vacuum transistor has collector current of 1.1 mA, transconductance of 0.27 mS, collector resistance of 2.8 MΩ and voltage amplification factor of 750 when applying emitter voltage of 58 V. This vacuum transistor amplified ac signal, and voltage gain of 29 dB was obtained from a resistance of 100 kΩ as a load. The gain band width product of 1 MHz was obtained from frequency characteristics of voltage gain. Transconductance is greatly improved by increasing the number of tips of FEA when comparing with 2 μS of 1,024 - tip HfN-FEA at applying emitter voltage of 92 V.
Keywords
electrodes; field emitter arrays; hafnium compounds; triodes; HfN; collector electrode; current 1.1 mA; field emitter array; gain 29 dB; gain bandwidth product; resistance 2.8 Mohm; transconductance; triode structure; vacuum transistor; voltage 58 V; voltage 92 V; voltage amplification factor; Frequency measurement; Gain; Logic gates; Resistance; Transconductance; Transistors; Voltage measurement; Hafnium Nitride; amplifier; field emission; frequency characteristics; transconductance; vacuum transistor;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference (IVNC), 2010 23rd International
Conference_Location
Palo Alto, CA
Print_ISBN
978-1-4244-7889-7
Electronic_ISBN
978-1-4244-7888-0
Type
conf
DOI
10.1109/IVNC.2010.5563233
Filename
5563233
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