• DocumentCode
    1921796
  • Title

    11.1: Development of vacuum transistor using hafnium nitride field emitter array

  • Author

    Ikeda, Keita ; Ohue, Wataru ; Endo, Keisuke ; Gotoh, Yasuhito ; Tsuji, Hiroshi

  • Author_Institution
    Dept. of Electron. Sci. & Eng., Kyoto Univ., Kyoto, Japan
  • fYear
    2010
  • fDate
    26-30 July 2010
  • Firstpage
    207
  • Lastpage
    208
  • Abstract
    We fabricated gated 40,000-tip HfN-FEAs and evaluated HfN-FEA as an active device. The vacuum transistor has triode structure of a gated HfN-FEA and collector electrode. This vacuum transistor has collector current of 1.1 mA, transconductance of 0.27 mS, collector resistance of 2.8 MΩ and voltage amplification factor of 750 when applying emitter voltage of 58 V. This vacuum transistor amplified ac signal, and voltage gain of 29 dB was obtained from a resistance of 100 kΩ as a load. The gain band width product of 1 MHz was obtained from frequency characteristics of voltage gain. Transconductance is greatly improved by increasing the number of tips of FEA when comparing with 2 μS of 1,024 - tip HfN-FEA at applying emitter voltage of 92 V.
  • Keywords
    electrodes; field emitter arrays; hafnium compounds; triodes; HfN; collector electrode; current 1.1 mA; field emitter array; gain 29 dB; gain bandwidth product; resistance 2.8 Mohm; transconductance; triode structure; vacuum transistor; voltage 58 V; voltage 92 V; voltage amplification factor; Frequency measurement; Gain; Logic gates; Resistance; Transconductance; Transistors; Voltage measurement; Hafnium Nitride; amplifier; field emission; frequency characteristics; transconductance; vacuum transistor;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference (IVNC), 2010 23rd International
  • Conference_Location
    Palo Alto, CA
  • Print_ISBN
    978-1-4244-7889-7
  • Electronic_ISBN
    978-1-4244-7888-0
  • Type

    conf

  • DOI
    10.1109/IVNC.2010.5563233
  • Filename
    5563233