Advantages of the Methodology Using DOE and Simulation for Optimising Advanced Technologies - Application to a Real 0.35 μM PMOS Architecture

This paper shows that a rigorous methodology, using DoE and calibrated simulators, in order to optimise complex technologies can lead to a real improvement of the optimal point found by a classical go and fro experimental approach; the two approaches are compared in terms of performances and in terms of available information to estimate the manufacturability of a process.