Title :
On Increasing the Accuracy of Simulations of Deposition and Etching Processes Using Radiosity and the Level Set Method
Author :
Heitzinger, Clemens ; Fugger, Josef ; Haberlen, Oliver ; Selberherr, Siegfried
Author_Institution :
Institute for Microelectronics, Vienna, Austria
fDate :
24-26 September 2002
Keywords :
Computational modeling; Etching; Level set; Manufacturing processes; Predictive models; Rough surfaces; Semiconductor device manufacture; Silicon; Surface roughness; Surface topography;
Conference_Titel :
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN :
88-900847-8-2
DOI :
10.1109/ESSDERC.2002.194940
