1922967

Gate Dielectrics for High Performance and Low Power CMOS SoC Applications

Cubaynes, F.N. ; Dachs, C.J.J. ; Detcheverry, C. ; Zegers, A. ; Venezia, V.C. ; Schmitz, J. ; Stolk, P.A. ; Jurczak, M. ; Henson, K. ; Degraeve, R. ; Rothschild, A. ; Conard, T. ; Petry, J. ; Da Rold, M. ; Schaekers, M. ; Badenes, G. ; Date, L. ; Pique, D

Philips Research, Leuven, Belgium

2002

24-26 September 2002

427

430

Annealing; Dielectrics; Furnaces; Implants; Oxidation; Plasma applications; Plasma devices; Plasma materials processing; Rapid thermal processing; System-on-a-chip;

English

ieee

Solid-State Device Research Conference, 2002. Proceeding of the 32nd European

88-900847-8-2

conf

10.1109/ESSDERC.2002.194959

1503889