DocumentCode :
1923316
Title :
The RF Potential of High-performance 100nm CMOS Technology
Author :
Venezia, V.C. ; Scholten, A.J. ; Detcheverry, C. ; Boots, H. ; Jeamsaksin, W. ; Grau, L. ; Klaassen, D.B.M. ; Velghe, R.M.D.A. ; Havens, R.J. ; Tiemeijer, L.F.
Author_Institution :
Philips Research, Leuven, Belgium
fYear :
2002
fDate :
24-26 September 2002
Firstpage :
491
Lastpage :
494
Keywords :
CMOS technology; Cutoff frequency; Dielectric substrates; Electrical resistance measurement; Etching; Length measurement; MOS devices; Radio frequency; Scanning electron microscopy; Semiconductor device modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN :
88-900847-8-2
Type :
conf
DOI :
10.1109/ESSDERC.2002.194975
Filename :
1503905
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1923316
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