Controlling STI-related Parasitic Conduction in 90 nm CMOS and Below

Author

Augendre, E. ; Rooyackers, R. ; Shamiryan, D. ; Ravit, C. ; Jurczak, M. ; Badenes, G.

Author_Institution

IMEC, Leuven, Belgium

fYear

2002

fDate

24-26 September 2002

Firstpage

507

Lastpage

510

Keywords

Etching; Hafnium; Isolation technology; Oxidation; Plasma temperature; Polymers; Silicon; Subthreshold current; Threshold voltage; Voltage control;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 2002. Proceeding of the 32nd European

Print_ISBN

88-900847-8-2

Type

DOI

10.1109/ESSDERC.2002.194979

Filename

1503909

Link To Document