Title :
Controlling STI-related Parasitic Conduction in 90 nm CMOS and Below
Author :
Augendre, E. ; Rooyackers, R. ; Shamiryan, D. ; Ravit, C. ; Jurczak, M. ; Badenes, G.
Author_Institution :
IMEC, Leuven, Belgium
fDate :
24-26 September 2002
Keywords :
Etching; Hafnium; Isolation technology; Oxidation; Plasma temperature; Polymers; Silicon; Subthreshold current; Threshold voltage; Voltage control;
Conference_Titel :
Solid-State Device Research Conference, 2002. Proceeding of the 32nd European
Print_ISBN :
88-900847-8-2
DOI :
10.1109/ESSDERC.2002.194979
