DocumentCode :
1923884
Title :
Development of high accuracy wafer thinning and pickup technology for thin wafer(die)
Author :
Miyazaki, Chuichi ; Shimamoto, Haruo ; Uematsu, Toshihide ; Abe, Yoshiyuki ; Kitaichi, Kosuke ; Morifuji, Tadahiro ; Yasunaga, Shoji
fYear :
2010
fDate :
24-26 Aug. 2010
Firstpage :
1
Lastpage :
4
Abstract :
Accurate wafer thinning and picking up die technology around 10μm thickness were evaluated. We obtained the prospect that thickness accuracy 10±1μm which is the target of the ultra thin grinding, by applying new technology like Non-contact gauge or Auto TTV. For picking up the ultra thin dies, we found the best tool design rule and some machine condition in slider peel method.
Keywords :
three-dimensional integrated circuits; wafer bonding; wafer level packaging; high accuracy wafer thinning; pickup technology; slider peel method; thin wafer; ultra thin dies; Accuracy; Glass; Heating; Substrates; Thickness measurement; Wheels;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
CPMT Symposium Japan, 2010 IEEE
Conference_Location :
Tokyo
Print_ISBN :
978-1-4244-7593-3
Type :
conf
DOI :
10.1109/CPMTSYMPJ.2010.5679528
Filename :
5679528
Link To Document :
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