• DocumentCode
    1924024
  • Title

    The spherical pinch plasma radiation source (SPX II) for X-ray UV and deep UV lithography

  • Author

    Aithal, Sachin ; Chen, Huanting ; Chen, Jiann-Jong ; Hilko, B. ; Lamari, Moktar ; Singh, Dhirendra Pratap ; Vaselli, M. ; Gimmanco, F. ; Panarella, E.

  • Author_Institution
    Advanced Laser & Fusion Technol., Inc., Hull, Que., Canada
  • fYear
    1993
  • fDate
    7-9 June 1993
  • Firstpage
    108
  • Abstract
    Summary form only given. The broadband radiation emission of SPX II extends from UV (10 eV) to soft X-rays (1.2 keV), and the relative levels of radiation depend upon the electrical energy stored in the condenser bank. By using appropriate filters like beryllium foils, and a radiochromic film detector at 20 cm from the source, the soft X-ray flux in the 1 keV to 1.2 keV region has been measured at various electric energy levels. SPX II is capable of discharging at a repetition rate of /spl sim/0.1 Hz, and therefore a required dose of radiation at the detector can be obtained by choosing the appropriate number of discharges for a given input electrical energy level. The variation of X-ray power and exposure time required to reach a dose level of 10 mJ/sq. cm, as a function of electrical energy input, is shown.
  • Keywords
    pinch effect; 1 to 1.2 keV; 10 eV; Be; SPX II; X-ray lithography; X-ray power; beryllium foils; broadband radiation emission; condenser bank; deep UV lithography; exposure time; input electrical energy level; radiochromic film detector; repetition rate; soft X-rays; spherical pinch plasma radiation source; Atomic beams; Atomic measurements; Construction industry; Laser fusion; Lithography; Optical materials; Plasma sources; Plasma x-ray sources; Prototypes; X-ray lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
  • Conference_Location
    Vancouver, BC, Canada
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-1360-7
  • Type

    conf

  • DOI
    10.1109/PLASMA.1993.593114
  • Filename
    593114