• DocumentCode
    1925701
  • Title

    Shape registration via the wavelet transform

  • Author

    Chalfant, Julie S. ; Patrikalakis, Nicholas M.

  • Author_Institution
    Massachusetts Inst. of Technol., Cambridge, MA
  • fYear
    2008
  • fDate
    4-6 June 2008
  • Firstpage
    277
  • Lastpage
    278
  • Abstract
    We present a system for the automatic global registration of voxelized data using the wavelet transform. The huge size of current data sets makes such multi-resolution techniques appealing; however, the traditional discrete wavelet transform has the drawback of variance with translation and rotation. We employ the dual-tree complex wavelet transform (Kingsbury, 2003), which carefully adds near invariance to translation and reduced sensitivity to rotation in computationally efficient ways, thus enabling the object matching application. We employ the wavelet transform to accomplish registration by extracting features in a multi-resolutional format, thus rapidly detecting and matching feature points. The method is robust to occlusion, clutter and noise. The efficacy of the algorithm is demonstrated through examples from solid modeling and biomedical applications.
  • Keywords
    discrete wavelet transforms; feature extraction; image registration; image resolution; trees (mathematics); automatic global registration; discrete wavelet transform; dual-tree complex wavelet transform; features extraction; multi-resolution techniques; multi-resolutional format; near invariance; object matching application; shape registration; voxelized data; Computed tomography; Computer vision; Discrete wavelet transforms; Feature extraction; Histograms; Magnetic resonance imaging; Shape; Voting; Wavelet coefficients; Wavelet transforms; I.5.2 [Pattern Recognition]: Design Methodology—Feature evaluation and selection; Shape-Based Matching; Three-Dimensional Object Registration; Wavelets;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Shape Modeling and Applications, 2008. SMI 2008. IEEE International Conference on
  • Conference_Location
    Stony Brook, NY
  • Print_ISBN
    978-1-4244-2260-9
  • Electronic_ISBN
    978-1-4244-2261-6
  • Type

    conf

  • DOI
    10.1109/SMI.2008.4548005
  • Filename
    4548005