DocumentCode :
1926157
Title :
Break-through of the Si limit under 300 V breakdown voltage with new concept power device: super 3D MOSFET
Author :
Sakakibara, Jun ; Suzuki, Naohiro ; Yamaguchi, Hitoshi
Author_Institution :
Res. Labs., DENSO Corp., Aichi, Japan
fYear :
2002
fDate :
2002
Firstpage :
233
Lastpage :
236
Abstract :
In this paper, we present a new conceptual power MOSFET named "super 3D MOSFET", breaking the Ron Si limit under 300 V breakdown voltage. It has a super wide current path in the depth direction of the substrate. The electrical characteristics of this device were verified by 3D device simulation. In the super 3D MOSFET with 30 μm current path width, the simulated results showed that the drift resistance was 6.6 mΩ-mm2 for 70 V breakdown voltage. For this breakdown voltage, the Ron Si limit is 23 mΩ-mm2. The total specific on-resistance containing the other elemental resistances was 19 mΩ-mm2, and even this value was below the Ron Si limit. Moreover, we fabricated the super 3D MOSFET experimentally, and the I-V characteristics were verified.
Keywords :
electric current; electric resistance; power MOSFET; semiconductor device breakdown; semiconductor device measurement; semiconductor device models; 30 micron; 300 V; 3D device simulation; I-V characteristics; Si on-resistance limit break-through; breakdown voltage; device simulation; drift resistance; electric characteristics; elemental resistances; power device; specific on-resistance; substrate depth direction; super 3D MOSFET; super wide current path; Contact resistance; Doping; Electric resistance; Electric variables; Electrodes; Laboratories; MOSFET circuits; Neodymium; Power MOSFET; Switches;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs, 2002. Proceedings of the 14th International Symposium on
Print_ISBN :
0-7803-7318-9
Type :
conf
DOI :
10.1109/ISPSD.2002.1016214
Filename :
1016214
Link To Document :
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