• DocumentCode
    1926203
  • Title

    24 mΩcm2 680 V silicon superjunction MOSFET

  • Author

    Onishi, Y. ; Iwamoto, S. ; Sato, Takao ; Nagaoka, T. ; Ueno, K. ; Fujihira, T.

  • Author_Institution
    Fuji Hitachi Power Semicond. Co. Ltd, Matsumoto, Japan
  • fYear
    2002
  • fDate
    2002
  • Firstpage
    241
  • Lastpage
    244
  • Abstract
    A silicon superjunction MOSFET with very low specific on-resistance, RonA, and very low RonQgd, where Qgd is the gate-to-drain switching charge, is reported. RonA and RonQgd achieved are 24 mΩcm2 and 2.0 ΩnC at the breakdown voltage of 680 V, which are the lowest among the reported values for high-voltage silicon power MOSFETs with breakdown voltage above 500 V. Numerical analysis and discussions on the design of the buried epitaxial superjunction technology are also presented.
  • Keywords
    buried layers; electric resistance; numerical analysis; power MOSFET; semiconductor device breakdown; semiconductor device measurement; semiconductor device models; 500 V; 680 V; Si; breakdown voltage; buried epitaxial superjunction technology design; gate-to-drain switching charge; numerical analysis; silicon power MOSFET; silicon superjunction MOSFET; specific on-resistance; switching charge-on-resistance product; Breakdown voltage; Doping profiles; Epitaxial layers; MOSFET circuits; Numerical analysis; Power MOSFET; Power conversion; Power supplies; Robustness; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and ICs, 2002. Proceedings of the 14th International Symposium on
  • Print_ISBN
    0-7803-7318-9
  • Type

    conf

  • DOI
    10.1109/ISPSD.2002.1016216
  • Filename
    1016216