DocumentCode :
1926238
Title :
Determination of copper concentration in a SF/sub 6/ arc plasma in an electrical circuit breaker
Author :
Fleurier, C. ; Ciobanu, S.S. ; Hong, D. ; Gentils, F. ; Fievet, C.
Author_Institution :
GREMI, Orleans Univ., France
fYear :
1997
fDate :
19-22 May 1997
Firstpage :
299
Abstract :
Summary form only given, as follows. Measurements of particle temperatures and concentrations were performed for a transient and unstable plasma arc in an industrial circuit breaker operated in a 3 atm SF/sub 6/ gas. The large current intensity caused an important vaporization of the electrodes so that the plasma developed in a mixture of SF/sub 6/ and Cu. Time resolved photographs of the are obtained with interference filters showed a compact and homogeneous zone dominated by a S/sup +/-F plasma, and an inhomogeneous zone close to the electrodes dominated by Cu. Average electron densities and temperatures and also the total number of the different emitting atoms or ions were determined in the two zones by spectroscopy using simultaneous time resolved measurements at high and low spectral resolution. Particle concentrations were obtained after an estimate of the volumes of the different plasma zones by spectroscopical methods. Copper density was also inferred from absorption measurements on copper resonance lines by means of a bright flash produced by a Z-pinch discharge. This method allowed to overcome the problem of light beam random deviation by the strong turbulence in the plasma chamber.
Keywords :
Z pinch; arcs (electric); circuit-breaking arcs; copper; plasma density; plasma diagnostics; plasma temperature; plasma turbulence; 3 atm; Cu; Cu concentration; SF/sub 6/; SF/sub 6/ arc plasma; Z-pinch discharge; absorption measurements; current intensity; electrical circuit breaker; electron density; electron temperature; interference filters; particle temperature; plasma chamber; strong turbulence; time resolved measurements; time resolved photographs; transient unstable plasma arc; Atomic measurements; Copper; Density measurement; Electrodes; Plasma applications; Plasma density; Plasma measurements; Plasma temperature; Spectroscopy; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location :
San Diego, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-3990-8
Type :
conf
DOI :
10.1109/PLASMA.1997.605114
Filename :
605114
Link To Document :
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