Title :
The use of pulsed, intense ion beams for thermal surface treatment
Author :
Stinnett, R.W. ; McIntyre, D.C. ; Greenly, J.B.
Author_Institution :
Sandia Nat. Lab. Albuquerque, NM, USA
Abstract :
Summary form only given. New developments in repetitive pulsed power and ion beam technology at Sandia National Laboratories and Cornell University may enable the use of repetitively pulsed, intense ion beams for commercial surface treatment applications. This capability is being developed in the joint Sandia-Cornell Ion BEam Surface Treatment (IBEST) program. This program uses the Repetitive High Energy Pulsed Power (RHEPP) facility together with magnetically confined anode plasma (MAP) ion diode technology to produce a system capable of operation at 0.5-1 MV and 2.5 kJ/pulse at repetition rates up to 120 Hz. This system should make it possible to treat metal and ceramic surfaces with ion beams which deposit 2-20 Joule/cm/sup 2/ uniformly in the top 2-10 /spl mu/m of the surface. Initial results of thermal surface treatment of 0-1 tool steel with a 10 J/cm/sup 2/, 1 MeV mixed proton and carbon ion beam on the LION accelerator at Cornell University demonstrated an increase in surface hardness by a factor of three and the formation of a finer-grain structure in the treated region.
Keywords :
surface treatment; 0.5 to 1 MV; 1 MeV; 120 Hz; C; IBEST; LION accelerator; MAP; RHEPP; Repetitive High Energy Pulsed Power; c beams; ceramic surfaces; commercial surface treatment; finer-grain structure; intense ion beams; ion diode technology; magnetically confined anode plasma; metal surfaces; proton beams; pulsed ion beams; repetition rates; repetitive pulsed power; surface hardness; thermal surface treatment; Anodes; Ceramics; Diodes; Ion beams; Laboratories; Magnetic confinement; Plasma applications; Plasma confinement; Surface treatment; Thermal factors;
Conference_Titel :
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location :
Vancouver, BC, Canada
Print_ISBN :
0-7803-1360-7
DOI :
10.1109/PLASMA.1993.593133