Title :
A feasibility study of proximity interconnect technology utilizing transmission line coupling
Author :
Iguchi, Daisuke ; Akiyama, Yutaka ; Fujii, Fumiaki ; Otsuka, Kanji
Author_Institution :
Fuji Xerox Co., Ltd., Ebina, Japan
Abstract :
Presented in this paper is a feasibility study of a chip stacking technology for very high bandwidth communication. This technology utilizes transmission line coupling between coplanar differential lines constructed in metal layers of two chips placed facing each other such that the differential pairs are overlapped with a spacing of many microns. In previous study we demonstrated communication at 12.5 GHz between two differential pairs of transmission lines fabricated on different metal layers in a single chip. As the next step of the study, we developed the second test chip to demonstrate actual communication between two LSI chips using this technology. The test chip includes a high-speed hysteresis-type receiver that extracts the original digital signals from differentiated signals result from the coupling region. In this chip, effect of AC coupling capacitors placed between the driver output and the transmission-line-coupling region in order to reduce power consumption can be also investigated. Evaluation of the second test chip is in progress.
Keywords :
MMIC; capacitors; coplanar transmission lines; integrated circuit interconnections; large scale integration; AC coupling capacitors; LSI chips; bandwidth communication; chip stacking technology; coplanar differential lines; feasibility study; frequency 12.5 GHz; high-speed hysteresis-type receiver; metal layers; power consumption; proximity interconnect technology; test chip; transmission line coupling; transmission-line-coupling region; Capacitors; Couplings; Driver circuits; Metals; Receivers; Semiconductor device measurement; Transmission line measurements;
Conference_Titel :
CPMT Symposium Japan, 2010 IEEE
Conference_Location :
Tokyo
Print_ISBN :
978-1-4244-7593-3
DOI :
10.1109/CPMTSYMPJ.2010.5679875