Title :
Applications of pulsed energy sources and hydrodynamic response to materials science
Author :
Perry, Frank ; Nelson, Weston
Author_Institution :
Sandia Nat. Lab., Albuquerque, NM, USA
Abstract :
Summary form only given. In order to address materials science applications involved pulsed beams, high-quality, energy deposition-hydrodynamic code techniques which can aid in the design and interpretation of experiments are being developed and used. These codes are capable of computing temperature, pressure, density, and dynamic quantities (material displacement and velocity), as a function of space (one-dimension) and time. However, they are not capable of calculating heterogeneous effects. In evaporative deposition of thin films the ion beam-target interactions may lead to 3-D, heterogeneous, material species and thermodynamic phases (including condensed phases) in the ablation plume which may compromise the quality of the film deposition. Consequently, the authors strongly encourage the development of 3-D, species selective diagnostic technqiues, e.g., resonant holographic interferometry spectroscopy for use in analyzing the ablation plume in thin-film deposition experiments.
Keywords :
thin films; ablation plume; density; dynamic quantities; energy deposition-hydrodynamic code techniques; evaporative deposition; heterogeneous effects; hydrodynamic response; ion beam-target interactions; material displacement; materials science; pressure; pulsed beams; pulsed energy sources; resonant holographic interferometry spectroscopy; species selective diagnostic technqiues; temperature; thermodynamic phases; thin-film deposition; velocity; Holography; Hydrodynamics; Ion beams; Laboratories; Laser theory; Materials science and technology; Optical materials; Power engineering and energy; Pulsed laser deposition; Surface treatment;
Conference_Titel :
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location :
Vancouver, BC, Canada
Print_ISBN :
0-7803-1360-7
DOI :
10.1109/PLASMA.1993.593150