Title :
Effects of interface oxidization in ferromagnetic tunnel junctions
Author :
Sato, M. ; Kikuchi, Hiroaki ; Kobayashi, K.
Author_Institution :
Fujitsu Laboratories
Keywords :
Annealing; Artificial intelligence; Atomic layer deposition; Cobalt alloys; Lithography; Polarization; Sputtering; Sun;
Conference_Titel :
Magnetics Conference, 1999. Digest of INTERMAG 99. 1999 IEEE International
Conference_Location :
Kyongju, Korea
Print_ISBN :
0-7803-5555-5
DOI :
10.1109/INTMAG.1999.837717
