• DocumentCode
    1931926
  • Title

    Novel polymer multilayer CMOS compatible technology for multilevel microfludic devices

  • Author

    Agirregabiria, M. ; Blanco, F.J. ; Berganzo, J. ; Ruano-López, J.M. ; Aranburu, I. ; García, J. ; Mayora, K.

  • Author_Institution
    MEMS/MST Dept., IKERLAN S. Coop., Arrasate
  • fYear
    2005
  • fDate
    2-4 Feb. 2005
  • Firstpage
    221
  • Lastpage
    224
  • Abstract
    This work describes a novel fabrication process based on successive wafer level bonding and releasing steps, that allow us to stack several photopatterned SU-8 layers. Based on a low temperature bonding process, this work enhances it by the use of a Kaptontrade film as one of the substrates where the SU-8 is spun. The lack of adhesion between KaptonTM and SU-8 offers the possibility to release the top substrate after the bonding and continue repeating the same steps to obtain multilayer stacks. Multilevel interconnected microfluidic channels with good sidewall profiles are achieved. In addition, the Kaptontrade releasing step leaves the fabricated structures in contact with the outside simplifying the packaging, which is described in this work
  • Keywords
    CMOS integrated circuits; microfluidics; multilayers; photolithography; polymer films; wafer bonding; CMOS compatible technology; Kapton film; fabrication process; microfluidic devices; photopatterned SU-8 layers; polymer multilayer; wafer level bonding; Adhesives; Bonding processes; CMOS technology; Fabrication; Microfluidics; Nonhomogeneous media; Polymers; Substrates; Temperature; Wafer bonding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices, 2005 Spanish Conference on
  • Conference_Location
    Tarragona
  • Print_ISBN
    0-7803-8810-0
  • Type

    conf

  • DOI
    10.1109/SCED.2005.1504362
  • Filename
    1504362