• DocumentCode
    1933034
  • Title

    Trends in Three-Dimensional Integration

  • Author

    Akasaka, Yoichi

  • Author_Institution
    Mitsubishi Electric Corp., LSI R&D Laboratory, 4-1 Mizuhara, Itami, 664, Japan
  • fYear
    1987
  • fDate
    14-17 Sept. 1987
  • Firstpage
    265
  • Lastpage
    273
  • Abstract
    VLSI will be reaching to the limit of minimization in the 1990s, and after that, further increase of packing density or functions night depend on the vertical integration technology and wafer scale integration. The 3-D ICs consisting of completely stacked active layers offers the flexibility of circuit design and composition of various devices. Three-dimensional (3-D) integration is expected to provide several advantages, such as 1) parallel processing, 2) high-speed operation, 3) high packing density, and 4) multifunctional operation. This will lead upto new system design and the novel functional device. It will become a big trend for VLSI in the next generation.
  • Keywords
    Capacitors; Insulation; Integrated circuit interconnections; Laboratories; Large scale integration; Parallel processing; Random access memory; Research and development; Three-dimensional integrated circuits; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1987. ESSDERC '87. 17th European
  • Conference_Location
    Bologna, Italy
  • Print_ISBN
    0444704779
  • Type

    conf

  • Filename
    5436382