DocumentCode
1933381
Title
Assessment of SIMOX material by optical waveguide losses
Author
Kassim, N Mohd ; Ho, H.P. ; Benson, T.M. ; Daveias, D E
Author_Institution
Department of Electrical and Electronic Engineering, University of Nottingham
fYear
1990
fDate
10-13 Sept. 1990
Firstpage
5
Lastpage
8
Abstract
The propagation loss of single-mode optical waveguides in multiple implant SIMOX wafers has been used to assess the quality of the superficial silicon layer. Increased attenuation can be correlated to the creation of thermal and new donors. Some higher loss wafers also show interfacial roughness which gives rise to additional scattering losses.
Keywords
Optical attenuators; Optical devices; Optical losses; Optical materials; Optical scattering; Optical waveguide components; Optical waveguides; Planar waveguides; Propagation losses; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1990. ESSDERC '90. 20th European
Conference_Location
Nottingham, England
Print_ISBN
0750300655
Type
conf
Filename
5436395
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