Title :
TITAN-RTA: a 2D integrated equipment and process model for simulation of rapid thermal processing
Author :
Jones, S K ; Gerodolle, A.
Author_Institution :
Plessey Research Caswell Ltd, Allen Clark Research Centre, Caswell Towcester, Northants, UK
Abstract :
An integrated model for the simulation of the exact thermal behaviour of a silicon wafer during optical rapid thermal processing coupled to the microscopic thermal processing effects of dopant diffusion and oxidation is presented.
Keywords :
Error correction; Implants; Lamps; Optical microscopy; Oxidation; Predictive models; Rapid thermal processing; Semiconductor device modeling; Semiconductor process modeling; Temperature control;
Conference_Titel :
Solid State Device Research Conference, 1990. ESSDERC '90. 20th European
Conference_Location :
Nottingham, England
