Title :
Experiments and analysis of backscatter for microwave propagation in a plasma
Author :
Scharer, John E. ; Zhang, Yu Shrike ; Chapman, Barbara ; Lam, N.T.
Author_Institution :
Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI, USA
Abstract :
Summary form only given. Measurements and analysis of the absorption, reflection, and scattering of electromagnetic waves due to electron cyclotron absorption zones and the presence of modulated scatterers in a plasma are presented. Measurements using a modulated homodyne detection system have been made that are sensitive to the backscatter from a movable probe in the plasma. The phase sensitive system is used to measure the local k-spectrum in the inhomogeneous plasma and is compared with WKB (Wentzel-Kramers-Brillouin) theory. A 12-cm-diameter by 2-m laboratory plasma is produced by a 2.45-GHz microwave source. Wideband wave absorption of 30-50 dB due to the electron cyclotron resonance zone in the 1.5-3.0 GHz range is measured. Experiments examining the microwave scattering frequency sensitivity of modulation-launched magnetoacoustic modes from a ceramic encapsulated PIN diode and from a disc Langmuir probe scatterer have also been performed.
Keywords :
backscatter; 1.5 to 3.0 GHz; 12 cm; 2 m; 2.45 GHz; EM wave absorption; EM wave reflection; EM wave scattering; WKB theory; backscatter; ceramic encapsulated PIN diode; disc Langmuir probe scatterer; electron cyclotron absorption zones; inhomogeneous plasma; local k-spectrum; microwave propagation; microwave scattering frequency sensitivity; microwave source; modulated homodyne detection system; modulated scatterers; modulation-launched magnetoacoustic modes; movable probe; phase sensitive system; plasma; wideband wave absorption; Backscatter; Cyclotrons; Electromagnetic measurements; Electromagnetic scattering; Electromagnetic wave absorption; Electrons; Microwave propagation; Plasma measurements; Plasma sources; Plasma waves;
Conference_Titel :
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location :
Vancouver, BC, Canada
Print_ISBN :
0-7803-1360-7
DOI :
10.1109/PLASMA.1993.593400