Plasma generation in an organic molecular gas by an ultraviolet laser pulse

Summary form only given. Plasma generation in an organic molecular gas through a one-photon ionization process is studied. A 1-D model is derived to describe the photon flux flow and electron density evolution. Plasmas are generated in a low-ionization potential gas, tetrakis (dimethylamino) ethylene (TMAE) vapor, through a one-photon ionization process by an ultraviolet laser beam (E - 10 mJ, /spl tau/ - 17 ns) at 193 nm. A new method is used to measure the 193-nm ultraviolet (UV) photon absorption cross-section in TMAE. It is determined to be 1.1 /spl plusmn/ 0.3 /spl times/ 10/sup -7/ cm/sup 2/ from the axial profile of electron density. A high-density sharp boundary plasma sheet produced by a UV sheet beam obtained from the laser output through an optical system is examined. The microwave reflection from the plasma sheet is examined, and the potential application of a TMAE plasma as a mirror for microwave reflections is discussed. When TMAE is ionized in a higher-pressure background gas (argon/helium), a highly collisional, diffuse-boundary plasma can be produced.