DocumentCode :
1934589
Title :
Hot-carrier experiments on scaled NMOS transistors
Author :
Woltjer, R. ; Paulzen, G.M. ; Woerlec, P.H. ; Juffermans, C.A.H. ; Lifka, H.
Author_Institution :
Philips Research Laboratories, 5600 JA Eindhoven, The Netherlands. Tel: 31-40-743551 Fax: 31-40-743390 Telex: 35000 phtc nl nlwtfau
fYear :
1990
fDate :
10-13 Sept. 1990
Firstpage :
249
Lastpage :
252
Abstract :
Hot-carrier reliability limits the operation voltage for downscaled NMOS transistors. Transistors made according to Quasi Constant Voltage Scaling with design rules between 2.5 ¿m and 0.25 ¿m are tested for reliability and performance. We show that this scaling is in accordance with hot-carrier reliability. The maximal output power (per unit width) is independent of the design rule, but a factor of two more output is possible for LDD transistors. The gate delay appears to be proportional to the design rule, independent of the drain structure.
Keywords :
Degradation; Extrapolation; Hot carriers; Laboratories; Lithography; MOSFETs; Power generation; Testing; Transconductance; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1990. ESSDERC '90. 20th European
Conference_Location :
Nottingham, England
Print_ISBN :
0750300655
Type :
conf
Filename :
5436447
Link To Document :
بازگشت