Title :
Spatial profiles of electron and optical emission characteristics in a planar RF inductively coupled argon plasma
Author :
Wendt, A.E. ; Beale, D.F. ; Mahoney, L.J. ; Shohet, J.L.
Author_Institution :
Eng. Res. Center for Plasma-Aided Manuf., Wisconsin Univ., Madison, WI, USA
Abstract :
Summary form only given. The authors report on an extensive spatial study of electron population characteristics and optical emission spectra of argon in a 23-cm-diameter planar RF induction source. Both Langmuir-probe and spatially resolved optical emission spectroscopy (OES) measurements have been made at equivalent axial and radial positions in the source over a pressure range of 1-100 mT and at select net RF power levels. Optical emission intensity measurements of the 811.5, 763.5, and 750.4 argon lines have been performed. Multipole magnetic field confinement has been shown to increase the uniformity and level of the electron density in low-pressure discharges. The effectiveness of a multipole magnetic field confinement boundary over the pressure range of interest has been investigated by examining electron density and EEDF (electron energy distribution function) profiles across the plane where substrates are positioned.
Keywords :
argon; 1 to 100 mtorr; Ar; Langmuir-probe; Rf inductively coupled plasma; electron characteristics; electron density; electron energy distribution function; electron population characteristics; low-pressure discharges; multipole magnetic field confinement; optical emission characteristics; optical emission intensity; optical emission spectra; planar RF induction source; spatial profiles; spatially resolved optical emission spectroscopy; Argon; Electron emission; Electron optics; Magnetic confinement; Magnetic field measurement; Power measurement; Radio frequency; Spatial resolution; Spectroscopy; Stimulated emission;
Conference_Titel :
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location :
Vancouver, BC, Canada
Print_ISBN :
0-7803-1360-7
DOI :
10.1109/PLASMA.1993.593426