Title :
FIB and DRIE combination for nanotip fabrication
Author :
Villanueva, G. ; Plaza, J.A. ; Sánchez-Amores, A. ; Bausells, J. ; Martínez, E. ; Samitier, J. ; Errachid, A.
Author_Institution :
Centro Nacional de Microelectron., Bellaterra, Spain
Abstract :
The authors have studied the fabrication of high-aspect ratio silicon tips by a combination of deep reactive ion etching and focused ion beam. The reactive ion etching is used to obtain so-called "rocket tips" which could be fabricated with a high aspect ratio. The rocket tips were further processed by using a focused ion beam to obtain nanotips at their apex. Typical results obtained were nanotips with a basis radius of 200 nm and a height of 2.5 μm, with an apex radius of 5 nm, located on top of a 3 μm wide and 9 μm high silicon column. The process would allow however obtaining column heights of several tens of microns.
Keywords :
atomic force microscopy; micromachining; nanotechnology; probes; sputter etching; 2.5 micron; 200 nm; 3 micron; 5 nm; 9 micron; DRIE; FIB; deep reactive ion etching; focused ion beam; nanotip fabrication; rocket tips; Anisotropic magnetoresistance; Atomic force microscopy; Fabrication; Ion beams; Laboratories; Probes; Rockets; Shafts; Silicon compounds; Wet etching;
Conference_Titel :
Electron Devices, 2005 Spanish Conference on
Conference_Location :
Tarragona
Print_ISBN :
0-7803-8810-0
DOI :
10.1109/SCED.2005.1504477
