A Novel Process for Silicide Formation using Dynamic Recoil Mixing

Author

Haworth, L.I. ; Hill, A.E. ; Holwill, R. ; Pilkington, R ; Robertson, J.M.

Author_Institution

Edinburgh Microfabrication Facility, Department of Electrical Engineering, University of Edinburgh, Edinburgh EH9 3JL, UK

fYear

1987

fDate

14-17 Sept. 1987

Firstpage

237

Lastpage

240

Keywords

Annealing; Atomic beams; Atomic layer deposition; Conductivity; Ion beams; Optical films; Silicides; Silicon; Substrates; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid State Device Research Conference, 1987. ESSDERC '87. 17th European

Conference_Location

Bologna, Italy

Print_ISBN

0444704779

Type

Filename

5436457

Link To Document