DocumentCode :
1934935
Title :
A Novel Process for Silicide Formation using Dynamic Recoil Mixing
Author :
Haworth, L.I. ; Hill, A.E. ; Holwill, R. ; Pilkington, R ; Robertson, J.M.
Author_Institution :
Edinburgh Microfabrication Facility, Department of Electrical Engineering, University of Edinburgh, Edinburgh EH9 3JL, UK
fYear :
1987
fDate :
14-17 Sept. 1987
Firstpage :
237
Lastpage :
240
Keywords :
Annealing; Atomic beams; Atomic layer deposition; Conductivity; Ion beams; Optical films; Silicides; Silicon; Substrates; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1987. ESSDERC '87. 17th European
Conference_Location :
Bologna, Italy
Print_ISBN :
0444704779
Type :
conf
Filename :
5436457
Link To Document :
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