DocumentCode
1935031
Title
A Novel Substrate Hot Electron and Hole Injection Structure with a Double Implanted Buried Channel Mosfet
Author
Sukvoon Yoon ; Siergiej, R. ; White, M.H.
Author_Institution
Lehigh University, Bethlehem, PA
fYear
1991
fDate
17-19 June 1991
Keywords
Charge carrier processes; Degradation; Drain avalanche hot carrier injection; Electron traps; Hot carriers; Implants; Insulation; Space charge; Substrate hot electron injection; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference, 1991. 49th Annual
Conference_Location
Boulder, CO, USA
Print_ISBN
0-87942-647-0
Type
conf
DOI
10.1109/DRC.1991.664731
Filename
664731
Link To Document